1/f noise investigations in small channel length amorphous silicon thin film transistors

Journal of Applied Physics

Volumn 83, Issue 7, 1998, Pages 3660-3667

  Rhayem, J ^a   Valenza, M ^a   Rigaud, D ^a   Szydlo, N ^b   Lebrun, H ^b  

^a UNIVERSITÉ MONTPELLIER II   (France)

^b Thomson LCD   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001520578     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366586     Document Type: Article

References (15)

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