Effect of Mg ion implantation on electrical properties of CuInSe2 thin films

Journal of Applied Physics

Volumn 87, Issue 7, 2000, Pages 3283-3286

  Tanaka, Tooru ^a   Wakahara, Akihiro ^a   Yoshida, Akira ^a   Ohshima, Takeshi ^b   Itoh, Hisayoshi ^b   Okada, Sohei ^b  

^a TOYOHASHI UNIVERSITY OF TECHNOLOGY   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001519746     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.372337     Document Type: Article

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