Ultrafast microscopy of laser ablation of refractory materials: Ultra low threshold stress-induced ablation

Journal of Photochemistry and Photobiology A: Chemistry

Volumn 145, Issue 3, 2001, Pages 183-194

  Koulikov, Serguei G ^a   Dlott, Dana D ^a  

^a UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Laser ablation; Titanium nitride; Ultrafast microscopy

Indexed keywords

EID: 0001428829     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1010-6030(01)00581-0     Document Type: Article

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