Nitrogen incorporation in thin oxides by constant current N2O plasma anodization of silicon and N2 plasma nitridation of silicon oxides

Applied Physics Letters

Volumn 69, Issue 8, 1996, Pages 1053-1055

  Kaluri, Sita R ^a   Hess, Dennis W ^a  

^a Lehigh University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001371232     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.116928     Document Type: Article

References (19)

1. M. Y. Hao, W. M. Chen, K. Lai, and J. C. Lee, Appl. Phys. Lett. 66, 1126 (1995).
2. S. B. Kang, S. O. Kim, J.-S. Byun, and H. J. Kim, Appl. Phys. Lett. 65, 2448 (1994).
3. E. C. Carr and R. A. Buhrman, Appl. Phys. Lett. 63, 54 (1993).
4. Z. Q. Yao, H. B. Harrison, S. Dimitrijev, and D. Sweatman, Appl. Phys. Lett. 64, 3584 (1994).
5. M. L. Green, D. Brasen, K. W. Evans-Lutterodt, L. C. Feldman, K. Krisch, W. Lennard, H.-T. Tang, L. Manchanda, and M.-T. Tang, Appl. Phys. Lett. 85, 849 (1994).
6. R. I. Hegde, P. J. Tobin, K. G. Reid, B. Maiti, and S. A. Ajuria, Appl. Phys. Lett. 66, 2882 (1995).
7. R. J. Hussey, T. L. Hoffman, Y. Tao, and M. J. Graham, J. Electrochem. Soc. 143, 221 (1996).
8. W. Ting, H. Hwang, J. Lee, and D. L. Kwong, J. Appl. Phys. 70, 1072 (1991).
9. Z. H. Lu, S. P. Tay, R. Cao, and P. Pianetta, Appl. Phys. Lett. 67, 2836 (1995).
10. M. Bhat, G. W. Yoon, J. Kim, and D. L. Kwong, Appl. Phys. Lett. 64, 2116 (1994).
11. Y. Saito, Appl. Phys. Lett. 68, 800 (1996).
12. P.-C. Chen, K. Y.-J. Hsu, J.-Y. Lin, and H.-L. Hwang, Jpn. J. Appl. Phys. 34, 973 (1995).
13. D. W. Hess, in Proceedings of the Symposium on Silicon Nitride and Silicon Dioxide Thin Insulating Films, edited by V. J. Kapoor and W. D. Brown (The Electrochemical Society, Pennington, NJ, 1994), p. 229.
14. J. M. Cook, D. E. Ibbotson, P. D. Foo, and D. L. Flamm, J. Vac. Sci. Technol. A 8, 1820 (1990).
15. J. M. Cook, D. E. Ibbotson, and D. L. Flamm. J. Vac. Sci. Technol. B 8, 1 (1990).
16. D. A. Carl, D. W. Hess, M. A. Lieberman, T. D. Nguyen, and R. Gronsky, J. Appl. Phys. 70, 3301 (1991).
17. D. F. Mitchell, K. B. Clark, J. A. Bardwell, W. N. Lennard, G. R. Massoumi, and I. V. Mitchell, Surf. Interface Anal. 21, 44 (1994).
18. Handbook of XPS, Perkin-Elmer Corporation (Oct. 1992).
19. A. Masuda, I. Fukushi, Y. Yonezawa, T. Minamikawa, A. Morimoto, M. Kumeda, and T. Shimizu, Jpn. J. Appl. Phys. 32, 2794 (1993).