Silicon contamination of diamond films deposited on silicon substrates in fused silica based reactors

Journal of Applied Physics

Volumn 79, Issue 6, 1996, Pages 3290-3298

  Borges, C F M ^a   Schelz, S ^b   St Onge, L ^a   Moisan, M ^a   Martinu, L ^b  

^a UNIVERSITÉ DE MONTRÉAL   (Canada)

^b ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0007165149     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.361228     Document Type: Article

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