Photoresist etching with dielectric barrier discharges in oxygen

Journal of Applied Physics

Volumn 82, Issue 12, 1997, Pages 6273-6280

  Falkenstein, Zoran ^a   Coogan, John J ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001123650     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366514     Document Type: Article

References (39)

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