New water-processable chemically amplified resists: Three steps, two tones, one solvent

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3333, Issue , 1998, Pages 438-446

  Darling, Graham D ^a   Vekselman, Alexander M ^b   Yamada, Shintaro ^c  

^a Active Materials Inc   (Canada)

^b AIM Co   (Canada)

^c UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Chemically amplified resists; Maleic anhydride copolymers; Microlithography; Plasma etch resistance; Vicinal dicarboxylate

Indexed keywords

CARBOXYLATION; COPOLYMERIZATION; COPOLYMERS; ESTERIFICATION; ESTERS; ETHERS; FUNCTIONAL GROUPS; HYDRATES; HYDRATION; MALEIC ANHYDRIDE; OXYGEN; PHOTORESISTORS; PHOTORESISTS; PLASMAS; POLYMERS; ULTRAVIOLET RADIATION;

CHEMICALLY AMPLIFIED RESISTS; MALEIC ANHYDRIDE COPOLYMERS; MICROLITHOGRAPHY; PLASMA ETCH RESISTANCE; VICINAL DICARBOXYLATE;

FUNCTIONAL POLYMERS;

EID: 0001231245     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.312402     Document Type: Conference Paper

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