Processing of porous GaAs at low frequency sparking

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 17, Issue 2, 1999, Pages 624-629

  Gudino Martinez A ^a   Rosendo, E ^a   Vidal, M A ^a   Navarro Contreras, H ^a   Rojas Lopez M ^a  

^a UNIVERSIDAD AUTÓNOMA DE SAN LUIS POTOSÍ   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001204838     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.581629     Document Type: Article

References (18)

1. R. E. Hummel and S. S. Chang, Appl. Phys. Lett. 61, 1965 (1992).
2. L. T. Canham, Appl. Phys. Lett. 57, 1046 (1990).
3. Lehmann and U. Goesele, Appl. Phys. Lett. 58, 856 (1991).
4. M. H. Ludwig, R. E. Hummel, and M. Stora, Thin Solid Films 255, 103 (1994). See also M. H. Ludwig, R. E. Hummel, and S. S. Chang, J. Vac. Sci. Technol. B 12, 3023 (1994).
5. M. H. Ludwig, R. E. Hummel, and M. Stora, Thin Solid Films 255, 103 (1994). See also M. H. Ludwig, R. E. Hummel, and S. S. Chang, J. Vac. Sci. Technol. B 12, 3023 (1994).
6. A. Gudiño-Martínez, C. Falcony, C. Vázquez-López, H. Navarro, M. A. Vidal, J. Araujo-Osorio, and J. G. Cabañas-Moreno, Thin Solid Films 281-282, 552 (1996).
7. A. Gudiño-Martínez, E. Rosendo, M. A. Vidal, and H. Navarro, Thin Solid Films 286-286, 558 (1998).
8. M. Lax, J. Appl. Phys. 48, 3919 (1977).
9. + laser radiation at 5145 Å, R=0.35 for GaAs. Therefore, for a spot with d=3 μm, ΔT ≈10°C.
10. M. S. Hsu, M. A. Meyers, and A. Berkowitz, Scr. Metall. Mater. 32, 805 (1995).
11. S. Hofmann, in Practical Surface Analysis, edited by D. Briggs and M. P. Seah (Wiley, New York, 1994), p. 143.
12. S. Rupp, J. Quilty, H. J. Trodahl, M. H. Ludwig, and R. E. Hummel, Appl. Phys. Lett. 70, 723 (1997).
13. K. K. Tiong, P. Amirtharaj, F. H. Pollak, and D. E. Aspnes, Appl. Phys. Lett. 44, 122 (1984).
14. J. T. Waugh and G. Doling, Phys. Rev. 132, 2410 (1963).
15. Y. Kayanuma, Phys. Rev. B 38, 9797 (1988).
16. Landolt-Börnstein, Numerical Data and Functional Relationships in Science and Technology, Group III: Crystal and Solid State Physics, Vol. 23a, Photoemission of Solids, edited by O. Madelung (Springer, Berlin, 1989).
17. M. H. Ludwig, A. Augustin, R. R. Hummel, and Th. Gross, J. Appl. Phys. 80, 5318 (1996).
18. M. H. Ludwig, R. E. Hummel, A. Augustin, and J. Hack, Appl. Phys. Lett. 67, 2542 (1995).