Magnetic properties of very thin single and multilayer NiFeCo and CoFe films deposited by sputtering

Journal of Applied Physics

Volumn 83, Issue 11, 1998, Pages 7034-7036

  Wang, D ^a   Daughton, J M ^a   Bussmann, K ^b   Prinz, G A ^b  

^a NVE CORPORATION   (United States)

^b NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001144534     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367724     Document Type: Article

References (6)

1. W. Vavra, S. F. Cheng, A. Fink, J. J. Krebs, and G. A. Prinz, Appl. Phys. Lett. 66, 2579 (1995).
2. R. K. Kawakami, E. J. Escorcia-Aparicio, and Z. Q. Qiu, J. Appl. Phys. 79, 4532 (1996).
3. J. M. Daughton and Y. J. Chen, J. Appl. Phys. 29, 2705 (1993).
4. D. Wang, J. Anderson, and J. M. Daughton, IEEE Trans. Magn. 33, 3520 (1997).
5. R. M. Bozorth, Ferromagnetism, edited by W. Perkins (IEEE, New York, 1993).
6. K. Bussmann, S. F. Cheng, G. A. Prinz, Y. Hu, D. Wang, and R. Beech (these proceedings).