The 248-nm excimer-laser-ablation mechanism of liquid benzene derivatives: Photochemical formation of benzyl radical leads to ablation

Journal of Physical Chemistry A

Volumn 102, Issue 10, 1998, Pages 1661-1665

  Tsuboi, Yasuyuki ^a,b   Hatanaka, Koji ^a   Fukumura, Hiroshi ^a   Masuhara, Hiroshi ^a  

^a OSAKA UNIVERSITY   (Japan)

^b KYOTO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001135204     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp973034a     Document Type: Article

References (29)

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