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Volumn 44, Issue 2, 1999, Pages 281-284

Comparison of permittivity of ion imlanted silicon and silicon bombared with neutrons

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[No Author keywords available]

Indexed keywords


EID: 0001101884     PISSN: 00295922     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (2)

References (3)
  • 2
    • 0031069194 scopus 로고    scopus 로고
    • Effect of ion implantation and annealing on the dielectric properties of silicon
    • Żukowski P., Partyka J., Wȩgierek P.: Effect of ion implantation and annealing on the dielectric properties of silicon. Phys. Stat. Sol. (a) 159, 509, 1997.
    • (1997) Phys. Stat. Sol. (A) , vol.159 , pp. 509
    • Zukowski, P.1    Partyka, J.2    Wȩgierek, P.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.