Robust optical delivery system for measuring substrate temperature during molecular beam epitaxy

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 17, Issue 1, 1999, Pages 253-256

  Thibado, P M ^a  

^a UNIVERSITY OF ARKANSAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001096877     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590508     Document Type: Article

References (6)

1. See, for example, Compd. Semicond. 1, 1 (1995).
2. E. S. Hellman and J. S. Harris, J. Cryst. Growth 81, 38 (1987).
3. B. V. Shanabrook, J. R. Waterman, J. L. Davis, J. R. Wagner, and D. S. Katzer, J. Vac. Sci. Technol. B 11, 994 (1993).
4. J. A. Roth, T. J. d. Lyon, and M. E. Adel, Mater. Res. Soc. Symp. Proc. 324, 353 (1994).
5. J. d. Lyon, J. A. Roth, and D. H. Chow, J. Vac. Sci. Technol. B 15, 329 (1997).
6. J. A. Roth, J.-J. Dubrary, D. H. Chow, P. D. Brewer, and G. L. Olson, Indium Phosphide and Related Materials Conference Proceedings, (1997), p. 253.