-
4
-
-
0001139790
-
-
M. J. Feldstein, P. Vohringer, W. Wang, and N. F. Scherer, J. Phys. Chem. 100, 4739 (1996).
-
(1996)
J. Phys. Chem.
, vol.100
, pp. 4739
-
-
Feldstein, M.J.1
Vohringer, P.2
Wang, W.3
Scherer, N.F.4
-
5
-
-
0027706238
-
-
C. Douketis, V. M. Shlaev, T. L. Haslett, Z. Wang, and M. Moskovits, J. Electron Spectrosc. Relat. Phenom. 64/65, 167 (1993).
-
(1993)
J. Electron Spectrosc. Relat. Phenom.
, vol.64-65
, pp. 167
-
-
Douketis, C.1
Shlaev, V.M.2
Haslett, T.L.3
Wang, Z.4
Moskovits, M.5
-
7
-
-
34848919386
-
-
G. Binning, H. Rohrer, C. Gerber, and E. Weibel, Phys. Rev. Lett. 49, 57 (1982).
-
(1982)
Phys. Rev. Lett.
, vol.49
, pp. 57
-
-
Binning, G.1
Rohrer, H.2
Gerber, C.3
Weibel, E.4
-
8
-
-
34250091543
-
-
J. K. Gimzewski, B. Reihl, J. H. Coombs, and R. R. Schlitter, Z. Phys. B 72, 497 (1988).
-
(1988)
Z. Phys. B
, vol.72
, pp. 497
-
-
Gimzewski, J.K.1
Reihl, B.2
Coombs, J.H.3
Schlitter, R.R.4
-
9
-
-
0001091354
-
-
R. Berndt, R. Gaisch, W. D. Schneider, J. K. Gimzewski, B. Reihl, R. R. Schlitter, and M. Tschudy, Phys. Rev. Lett. 74, 102 (1995).
-
(1995)
Phys. Rev. Lett.
, vol.74
, pp. 102
-
-
Berndt, R.1
Gaisch, R.2
Schneider, W.D.3
Gimzewski, J.K.4
Reihl, B.5
Schlitter, R.R.6
Tschudy, M.7
-
12
-
-
0001361424
-
-
V. Sivel, R. Coratger, F. Ajustron, and J. Beauvillain, Phys. Rev. B 45, 8634 (1992).
-
(1992)
Phys. Rev. B
, vol.45
, pp. 8634
-
-
Sivel, V.1
Coratger, R.2
Ajustron, F.3
Beauvillain, J.4
-
13
-
-
0000327387
-
-
A. W. McKinnon, M. E. Welland, T. M. H. Wong, and J. K. Gimzewski, Phys. Rev. B 48, 15250 (1993).
-
(1993)
Phys. Rev. B
, vol.48
, pp. 15250
-
-
McKinnon, A.W.1
Welland, M.E.2
Wong, T.M.H.3
Gimzewski, J.K.4
-
15
-
-
0001034959
-
-
V. Sivel, R. Coratger, F. Ajustron, and J. Beauvillain, Phys. Rev. B 51, 14598 (1995).
-
(1995)
Phys. Rev. B
, vol.51
, pp. 14598
-
-
Sivel, V.1
Coratger, R.2
Ajustron, F.3
Beauvillain, J.4
-
16
-
-
0001423045
-
-
T. Umeno, R. Nishitani, A. Kasuya, and Y. Nishina, Phys. Rev. B 54, 13499 (1996).
-
(1996)
Phys. Rev. B
, vol.54
, pp. 13499
-
-
Umeno, T.1
Nishitani, R.2
Kasuya, A.3
Nishina, Y.4
-
20
-
-
0026900560
-
-
Y. Uehara, Y. Kimura, S. Ushioda, and K. Takeuchi, Jpn. J. Appl. Phys., Part 1 31, 2465 (1992).
-
(1992)
Jpn. J. Appl. Phys., Part
, vol.1
, Issue.31
, pp. 2465
-
-
Uehara, Y.1
Kimura, Y.2
Ushioda, S.3
Takeuchi, K.4
-
23
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85034153864
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note
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Film thickness was determined by a calibrated quartz microbalance.
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24
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85034142976
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note
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The root-mean-square roughness of the substrate is measured to be less than 0.6 nm by AFM, hence a small contribution.
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25
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85034122445
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note
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To the best of our knowledge, no experimental value of photon creation efficiency for Au films has been reported before.
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26
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85034123573
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note
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F is the Fermi velocity, Ω is the resonance frequency of the surface plasmon mode of the metal particle, V is the bias voltage, W is the barrier height, and C is a constant. In Ref. 22, the authors indicated that the constant C is on the order of unity; the best fit to the experimental data is obtained with C = 0.5.
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