Femtosecond optical spectroscopy and scanning probe microscopy

Journal of Physical Chemistry

Volumn 100, Issue 12, 1996, Pages 4739-4748

  Feldstein, M J ^a   Vohringer P ^a,b,c   Wang, W ^a   Scherer, N F ^a,d  

^a UNIVERSITY OF PENNSYLVANIA   (United States)

^b Deutsche Forschungsgemeinschaft   (Germany)

^c MAX PLANCK INSTITUTE FOR BIOPHYSICAL CHEMISTRY   (Germany)

^d David and Lucille Packard Foundation

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001139790     PISSN: 00223654     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp9517918     Document Type: Article

References (67)

1. Cavanagh, R. F.; King, D. S.; Stephenson, J. C.; Heinz, T. F. J. Phys. Chem. 1993, 97 (4), 786-798.
2. Lanzafame, J. M.; Palese, S.; Wang, D.; Miller, R. J. D.; Muenter, A. A. J. Phys. Chem. 1994, 98 (43), 1020-11033.
3. Wiesendanger, R. Scanning Probe Microscopy and Spectroscopy; Cambridge University Press: Cambridge, 1994.
4. Hamers, R. J. Annu. Rev. Phys. Chem. 1989, 40, 531.
5. Fleming, G. Chemical Applications of Ultrafast Spectroscopy; Oxford University Press: New York, 1986.
6. Polanyi, J. C.; Zewail, A. H. Acc. Chem. Res. 1995, 28 (3), 119-132.
7. Becker, P. C.; Fragnito, H. L.; Bigot, J. Y.; Brito Cruz, C. H.; Shank, C. V. Phys. Rev. Lett. 1989, 63 (5), 505-507.
8. Specht, M.; Pedarnig, J. K.; Heckl, W. M.; Hänsch, T. W. Phys. Rev. Lett. 1992, 68 (4), 476-9.
9. Rücker, M.; Knoll, W.; Rabe, J. P. J. Appl. Phys. 1992, 72 (11), 5027-31.
10. Völcker, M.; Krieger, W.; Walther, H. Phys. Rev. Lett. 1991, 66 (13), 1717-20.
11. Bachelot, R.; Gleyzes, P.; Boccara, A. C. Opt. Lett. 1995, 20 (18), 1924-1926.
12. Gorbunov, A. A.; Pompe, W. Phys. Status Solidi A 1994, 145, 333-8.
13. Kuk, Y.; Becker, R. S.; Silverman, P. J.; Kochanski, G. P. Phys. Rev. Lett. 1990, 65 (4), 456-9.
14. Akari, S.; Lux-Steiner, M. Ch.; Vögt, M.; Stachel, M.; Dransfeld, K. J. Vac. Sci. Technol., B 1991, 9 (2), 561-3.
15. Bonnell, D. A.; Rohrer, G. S.; Frank, R. H. J. Vac. Sci. Technol., B 1991, 9 (2), 551-556.
16. Hamers, R. J.; Cahill, D. G. J. Vac. Sci. Technol., B 1991, 9 (2), 514-8.
17. Nunes, G., Jr.; Freeman, J. Science 1993, 262, 1029-32.
18. Weiss, S.; Ogleres, D. F.; Botkin, D.; Salameron, M.; Chemla, D. S. Appl. Phys. Lett. 1993, 63 (18), 2567-9.
19. Gerber, G.; Sattler, F.; Vögler, S.; Grand, J. R.; Leiderer, P.; Möller, R. Ultrafast Phenomena IX; Barbara, P. F., Knox, W. H., Mourou, B. A., Zewail, A. H., Eds.; Springer-Verlag: Berlin, 1994; pp 149-50.
20. Tersoff, J.; Hamann, D. R. Phys. Rev. B 1985, 31, 805.
21. Bian, R. X.; Dunn, R. C.; Xie, X. S.; Leung, P. T. Phys. Rev. Lett. 1995, 75 (26), 4772-5.
22. Raether, H. Surface Plasmons; Springer-Verlag: Berlin, 1988.
23. Burstein, E.; Chen, W. P.; Chen, Y. J.; Hanstein, A. J. Vac. Sci. Technol. 1974, 11 (6), 1004-1019.
24. Asaki, M. T.; Huang, C. P.; Garvey, D.; Zhou, J.; Kapteyn, H. C.; Murnane, M. M. Opt. Lett. 1993, 18, 977-979.
25. The film thickness was determined by monitoring a crystal sensor during deposition. The uncertainty in this thickness is on the order of ±25 Å.
26. With the exception of scatter, consideration of wave vector matching conditions shows that this signal can only be due to the equal interaction of both fields in the material.
27. The interference pattern can be washed out by small modulations of the probe path length, as has been done for the signals recorded and presented in Figures 3A-6A.
28. The tip is at ground relative to surface voltage; therefore, at negative bias the electron flow is from the surface to the tip.
29. Groeneveld, R. H. M.; Sprik, R.; Lagendijk, A. Phys. Rev. Lett. 1990, 64 (7), 784-7.
30. Wang, W.; Feldstein, M. J.; Scherer, N. F. Chem. Phys. Lett., submitted.
31. Simon, H. J.; Guha, J. K. Opt. Commun. 1976, 18 (3), 391-394.
32. van Exter, M.; Lagendijk, A. Phys. Rev. Lett. 1988, 60 (1), 49-52.
33. Feldstein, M. J.; Scherer, N. F. Work in progress.
34. Muggli, P.; Brogle, R.; Joshi, C. J. Opt. Soc. Am. B 1995, 12 (4), 553-8.
35. Tsang, T.; Srinivasan-Rao, T.; Fischer, J. Phys. Rev. B 1991, 43 (11), 8870-8.
36. Schoenlein, R. W.; Fujimoto, J. G.; Eesley, G. L.; Capehart, T. W. Phys. Rev. Lett. 1988, 61 (22), 2596-99.
37. Lingle, R. L.; Padowitz, D. F.; Jordan, R. E.; McNeill, J. D.; Harris, C. B. Phys. Rev. Lett. 1994, 72 (14), 2243-2246.
38. Riffe, D. M.; Wang, X. Y.; Downer, M. C.; Fisher, D. L.; Tajima, T.; Erskine, J. L.; More, R. M. J. Opt. Soc. Am. B 1993, 10 (8), 1424-1435.
39. Fujimototo, J. G.; Liu, J. M.; Ippen, E. P.; Bloembergen, N. Phys. Rev. Lett. 1984, 53 (19), 1837-1840.
40. Preuss, S.; Demchuk, A.; Stuke, M. Appl. Phys. A 1995, 61, 33-37.
41. Pronko, P. P.; Dutta, S. K.; Squier, J.; Rudd, J. V.; Du, D.; Mourou, G. Opt. Commun. 1995, 114, 106-110.
42. Aeschlimann, M.; Schmuttenmaer, C. A.; Elsayed-Ali, H. E.; Miller, R. J. D.; Cao, J.; Gao, Y.; Mantell, D. A. J. Chem. Phys. 1995, 102 (21), 8606-8613.
43. Fan, F. R. F.; Bard, A. J. Science 1995, 267 (5), 871-874.
44. Kadyshevitch, A.; Naaman, R. Phys. Rev. Lett. 1995, 74 (17), 3443-3446.
45. Möller, R.; Albrecht, U.; Boneberg, J.; Koslowski, B.; Leiderer, P.; Dransfeld, K. J. Vac. Sci. Technol., B 1991, 9 (2), 506-509.
46. 46
47. Lide, D. R., Ed. CRC Handbook of Chemistry and Physics, 74th ed.; CRC Press: Boca Raton, FL, 1993.
48. Douketis, C.; Shalaev, S. M.; Haslett, T. L.; Wang, Z. H.; Moskovits, M. J. Electron Spectrosc. Relat. Phenom. 1994, 64 (5), 167-175.
49. Chen, H.; Boneberg, J.; Leiderer, P. Phys. Rev. B 1993, 47 (15), 9956-8.
50. Shen, Y. R. Principles of Nonlinear Optics; J. Wiley: New York, 1984; pp 57-59.
51. Bass, M.; Franken, P. A.; Ward, J. F.; Weinreich, G. Phys. Rev. Lett. 1962, 9 (11), 446-448.
52. Ward, J. F. Phys. Rev. 1966, 143 (2), 569-574.
53. Ritchie, G.; Burstein, E.; Stephens, R. B. J. Opt. Soc. Am. B 1985, 2 (4), 544-551.
54. 56
55. Jericho, M. H.; Blackford, B. L.; Dahn, D. C. J. Appl. Phys. 1989, 65 (12), 5237-9.
56. Taylor, P.; Williams, R. S.; Chi, V. L.; Bishop, G.; Fletcher, J.; Robinett, W.; Washburn, S. Surf. Sci. 1994, 306 (1-2), 534-8.
57. van Hulst, N. F.; Segerink, F. B.; Bölger, B. Opt. Commun. 1992, 87 (5, 6), 212.
58. Miskovsky, N. M.; Park, S. H.; Culter, P. H.; Sullivan, T. E. J. Vac. Sci. Technol., B 1994, 12 (3), 2148-52.
59. Nguyen, H. Q.; Cutler, P. H.; Feuchtwang, T. E.; Huang, Z.; Kuk, Y.; Silverman, P. J.; Lucas, A. A.; Sullivan, T. E. IEEE Trans. Electron Devices 1989, 36 (11), 2671-8.
60. 6V/m
61. Hagmann, M. J. Appl. Surf. Sci. 1995, 87-88 (1-4), 368-372.
62. Dunn, R. C.; Allen, E. V.; Joyce, S. A.; Anderson, G. A.; Xie, X. S. Ultramicroscopy 1995, 57, 113-117.
63. Dunn, R. C.; Xie, X. S. Ultramicroscopy 1995, 57, 169-172.
64. Xie, X. S.; Dunn, R. C. Science 1994, 265, 361-364.
65. Smith, S.; Orr, B. G.; Kopelman, R.; Norris, T. Ultramicroscopy 1995, 57, 173-175.
66. Stark, J. B.; Mohideen, U. Quantum Electronic Conference; OSA Technical Digest Series 16; Optical Society of America; Washington, D.C., 1995; pp 83-84.
67. Koshland, D. E., Jr. Ed. Science 1991, 254, 1300-1341.