Transformation of deep-level spectrum of irradiated silicon due to hydrogenation under wet chemical etching

Semiconductor Science and Technology

Volumn 12, Issue 6, 1997, Pages 742-749

  Feklisova, Olga V ^a   Yarykin, Nikolai A ^a  

^a INSTITUTE OF MICROELECTRONICS TECHNOLOGY AND HIGH PURITY MATERIALS   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001025047     PISSN: 02681242     EISSN: None     Source Type: Journal    
DOI: 10.1088/0268-1242/12/6/017     Document Type: Article

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