Effective passivation of the low resistivity silicon surface by a rapid thermal oxide/plasma silicon nitride stack

Applied Physics Letters

Volumn 72, Issue 15, 1998, Pages 1872-1874

  Narasimha, S ^a   Rohatgi, A ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001002540     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.121211     Document Type: Article

References (10)

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