UV-laser investigation of dielectric thin films

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2714, Issue , 1996, Pages 426-439

  Ettrich, K ^a   Blaschke, Holger ^a   Welsch, Eberhard ^a   Thomsen Schmidt, Peter ^b   Schaefer, Dieter ^b  

^a Inst fur Optik/Quantenelektronik   (Germany)

^b Berliner Inst für Optik GmbH   (Germany)

Author keywords

Accumulation; Dielectric thin films; Displacement technique; Laser damage threshold; Multiple pulse damage; Photothermal beam deflection; Predamage; Thermal mirage technique; Ultraviolet

Indexed keywords

DIELECTRIC MATERIALS; FILM PREPARATION; FILMS; HAFNIUM COMPOUNDS; LASER DAMAGE; LASERS; MULTILAYER FILMS; MULTILAYERS; OPTICAL MATERIALS; SILICON COMPOUNDS; THIN FILMS;

ACCUMULATION; DIELECTRIC THIN FILMS; DISPLACEMENT TECHNIQUE; MULTIPLE-PULSE DAMAGE; PHOTOTHERMAL BEAM DEFLECTION; PREDAMAGE; THERMAL MIRAGE TECHNIQUE; ULTRAVIOLET;

PULSED LASER APPLICATIONS;

EID: 0000995207     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.240407     Document Type: Conference Paper

References (8)

1. R.E. Hummel and K.H. Guenther, editors. Optical Properties, volume I-Thin Films for Optical Coatings, Handbook Chapter 9. CRC Press, 1995.
2. th Annual Symposium on Optical Materials for High Power Lasers, Boulder Colorado, Oct. 24th-26th, 1994, published in Proc. SPIE Vol. 2428, 1995.
3. E. Welsch, K. Ettrich, and H. Blaschke. Eximer laser interaction with dielectric thin films. in press Appl.Surface Science, 1995.
4. E. Welsch, K. Ettrich, M. Peters, W. Ziegler, and H. Blaschke. Application of photothermal probe beam deflection technique for ablation and damage measurements by using short UV-laser pulses. J.de Phys., 4:C7-749, 1994.
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8. D. Schäfer, P. Thomsen-Schmidt, and et al. Single and multilayer coatings deposited by laser-assisted electron beam evaporation. In Optical Interference Coatings, volume 2253, page 502. SPIE, 1994.