Investigation and comparison of the noise in the gate and substrate current after soft-breakdown

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 38, Issue 4 B, 1999, Pages 2219-2222

  Crupi, Felice ^a,b   Degraeve, Robin ^a   Groeseneken, Guido ^a   Nigam, Tanya ^a   Maes, Herman ^a  

^a IMEC   (Belgium)

^b UNIVERSITY OF PISA   (Italy)

Author keywords

Correlated fluctuations; Random telegraph signal; Soft breakdown; Substrate current; Ultra thin oxide

Indexed keywords

EID: 0000935298     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.38.2219     Document Type: Article

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