Series operation of direct current xenon chloride excimer sources

Journal of Applied Physics

Volumn 88, Issue 6, 2000, Pages 3220-3224

  El Habachi, Ahmed ^a   Shi, Wenhui ^a   Moselhy, Mohamed ^a   Stark, Robert H ^a   Schoenbach, Karl H ^a  

^a Old Dominion University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000922771     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1288699     Document Type: Article

References (9)

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3. A. El-Habachi and K. H. Schoenbach, Appl. Phys. Lett. 12, 22 (1998).
4. P. Kurunczi, H. Shah, and K. Becker, J. Phys. B 32, L651 (1999).
5. W. Shi, A. El-Habachi and K. H. Schoenbach, Bull. Am. Phys. Soc. 44, 25 (1999).
6. K. H. Schoenbach, A. El-Habachi, M. Moselhy, W. Shi, and R. H. Stark, Phys. Plasmas 7, 2186 (2000).
7. A. El-Habachi, M. Moselhy, and K. H. Schoenbach, Bull. Am. Phys. Soc. 44, 67 (1999).
8. W. Shi, R. H. Stark, and K. H. Schoenbach, IEEE Trans. Plasma Sci. 27, 16 (1999).
9. J. T. Verdeyen, Laser Electronics. 3rd ed. (Prentice-Hall, Englewood Cliffs, NJ, 1995). p. 414.