SiO2/c-Si bilayer electron-beam resist process for nano-fabrication

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 35, Issue 12 SUPPL. B, 1996, Pages 6673-6678

  Gorwadkar, Sucheta M ^a   Wada, Toshimi ^a   Haraichi, Satoshi ^a   Hiroshima, Hiroshi ^a   Ishii, Kenichi ^a   Komuro, Masanori ^a  

^a ELECTROTECHNICAL LABORATORY   (Japan)

Author keywords

Electron beam lithography; Inorganic resist lift off; Nanostructures; SiO2 c Si EB resist; Wet etching

Indexed keywords

EID: 0010377343     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.35.6673     Document Type: Article

References (9)

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