Enhancing the field emission properties of amorphous carbon films by thermal annealing

Thin Solid Films

Volumn 337, Issue 1-2, 1999, Pages 257-260

  Burden, A P ^a,b   Forrest, R D ^a   Silva, S R P ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

^b RUTHERFORD APPLETON LABORATORY   (United Kingdom)

Author keywords

Amorphous hydrogenated carbon; Amorphous semiconductor; Annealing; FED; Field emission; Plasma enhanced chemical vapour deposition

Indexed keywords

EID: 0000902837     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)01385-6     Document Type: Article

References (14)

1. B.R. Chalamala, Y. Wei, B.E. Gnade, IEEE Spectrum 4 (1998) 42.
2. S. Bajic, R.V. Latham, J. Phys. D: Appl. Phys. 21 (1988) 200.
3. K. Okano, S. Koizumi, S.R.P. Silva, G.A.J. Amaratunga, Nature 381 (1996) 140.
4. J.E. Jaskie, MRS Bull. 3 (1996) 59.
5. G.A.J. Amaratunga, S.R.P. Silva, Appl. Phys. Lett. 68 (1996) 2529.
6. A.Y. Tcherepanov, A.G. Chakhovskoi, V.B. Sharov, J. Vac. Sci. Technol. B 13 (1995) 482.
7. W.A. De Heer, A. Châtelain, D. Ugarte, Science 270 (1995) 1179.
8. Q.H. Wang, A.A. Setlur, J.M. Lauerhaas, J.Y. Dai, E.W. Seelig, R.P.H. Chang, Appl. Phys. Lett. 72 (1998) 2912.
9. A.P. Burden, R.D. Forrest, S.R.P. Silva, B.J. Sealy, G.A.J. Amaratunga, Proc. MRS 498 (1998) 221.
10. P.M. May, S. Höhn, W.M. Wang, N.A. Fox, Appl. Phys. Lett. 72 (1998) 2182.
11. A.P. Burden, E. Mendoza, S.R.P. Silva, G.A.J. Amaratunga, Diamond Rel. Mater. 7 (1998) 495.
12. R.D. Forrest, A.P. Burden, S.R.P. Silva, L.K. Cheah, S. Xu, Appl. Phys. Lett. 1998 in press
13. J. Robertson, M.J. Rutter, Diamond Rel. Mater. 7 (1998) 620.
14. S.R.P. Silva, R.D. Forrest, A.P. Burden, et al., Amorphous Carbon: State of the Art, , World Scientific, Singapore, 1998 pp. 350-361.