Controlled Etching of Au:SR Cluster Compounds

Journal of Physical Chemistry B

Volumn 103, Issue 44, 1999, Pages 9394-9396

  Schaaff, T Gregory ^a,b   Whetten, Robert L ^a  

^a GEORGIA INSTITUTE OF TECHNOLOGY   (United States)

^b OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000842447     PISSN: 15206106     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp993229d     Document Type: Article

References (39)

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