Quantitative X-ray fluorescence characterization of BST films grown by MOCVD

Journal of the Korean Physical Society

Volumn 32, Issue 4 SUPPL., 1998, Pages

  Kwon, Hyun Ja ^a   Jo, William ^a   Kim, Hyun Ha ^a   Jeong, Young Woo ^a   Lee, Jeong Soo ^a   Yoon, Hak Ro ^b   Ban, In Seung ^b   Bogert, James R ^c  

^a LG   (South Korea)

^b Alpha Science Corporation   (South Korea)

^c California Technology International   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000706191     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (7)

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3. M. Yoshida, H. Yamaguchi, T. Sakuma and Y. Miyasaka, J. Electrochem. Soc. 142, 244 (1995).
4. T. Kawahara, M. Yamamuka, A. Yuuki and K. Ono, Jpn, J. Appl. Phys. 35, 4880 (1996).
5. D. Laguitton and W. Parrish, Anal. Chem. 49, 1152 (1977).
6. J. S. Lee, H. J. Kwon, H. H. Kim, Y. W. Jeong, H. R. Yoon and J. R. Bogert, unpublished.
7. JCPDS (Joint Committee on Powder Diffraction Standards), card no. 39-1395.