Theoretical modelling of phenomena in the pulsed-laser deposition process: Application to Ti targets ablation in low-pressure N2

Journal of Applied Physics

Volumn 86, Issue 11, 1999, Pages 6096-6106

  Neamtu, J ^a   Mihailescu, I N ^b   Ristoscu, Carmen ^b   Hermann, J ^c  

^a UNIVERSITY OF MEDICINE AND PHARMACY OF CRAIOVA   (Romania)

^b INSTITUTE OF ATOMIC PHYSICS   (Romania)

^c UNIVERSITÉ D'ORLÉANS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000657892     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.371659     Document Type: Article

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