Application of a stacked elastically bent perfect Si monochromator with identical and different crystallographic planes for single crystal and powder neutron diffractometry

Physica B: Condensed Matter

Volumn 283, Issue 4, 2000, Pages 295-298

  Tanaka, I ^a   Ahmed, F U ^a,b   Niimura, N ^a  

^a JAPAN ATOMIC ENERGY AGENCY   (Japan)

^b INSTITUTE OF NUCLEAR SCIENCE AND TECHNOLOGY   (Bangladesh)

Author keywords

Bent perfect monochromator; Intensity gain; Multi wavelength

Indexed keywords

EID: 0000632638     PISSN: 09214526     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0921-4526(00)00317-3     Document Type: Article

References (6)

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5. F. U. Ahmed, I. Tanaka, N. Niimura, J. Appl. Crystallogr. (2000) in press.
6. I. Tanaka, K. Kurihara, Y. Haga, Y. Minezaki, S. Fiyiwara, S. Kumazawa, N. Nümura, J. Phys. Chem. Solids 60 (1999) 1623.