Magnetoresistance Effect of Co-Cu Nanostructure Prepared by Electrodeposition Method

Journal of Solid State Chemistry

Volumn 147, Issue 1, 1999, Pages 274-280

  Ueda, Y ^a   Houga, T ^a   Zaman, H ^a   Yamada, A ^a  

^a MURORAN INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Giant magnetoresistance; multilayer film; Co Cu alloy film; electrodeposition; magnetic properties.

Indexed keywords

EID: 0000575289     PISSN: 00224596     EISSN: None     Source Type: Journal    
DOI: 10.1006/jssc.1999.8271     Document Type: Article

References (11)

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