Crystallization of amorphous silicon-germanium films deposited by low pressure chemical vapor deposition

Journal of Non-Crystalline Solids

Volumn 266-269 B, Issue , 2000, Pages 689-693

  Guillet, D ^a   Sarret, M ^a   Haji, L ^a   Rogel, R ^a   Bonnaud, O ^a  

^a UNIVERSITÉ DE RENNES 1   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000572005     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(99)00784-X     Document Type: Article

References (13)

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