Electronic control of site selective reactivity: A model combining charge migration and dissociation

Journal of Physical Chemistry A

Volumn 103, Issue 49, 1999, Pages 10149-10158

  Remacle, F ^a,c,d   Levine, R D ^a   Schlag, E W ^b   Weinkauf, R ^b  

^a HEBREW UNIVERSITY OF JERUSALEM   (Israel)

^b TECHNICAL UNIVERSITY OF MUNICH   (Germany)

^c FNRS   (Belgium)

^d UNIVERSITY OF LIÈGE   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000553453     PISSN: 10895639     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp991853k     Document Type: Article

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