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Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 6, 1998, Pages 3577-3581

Etching processes and characteristics for the fabrication of refractory x-ray masks

(4) Lercel, Michael J a,c Brooks, Cameron J a,c Benoit, Douglas E a,c Surendra, Maheswaran b

a LOCKHEED MARTIN (United States)

b IBM T J WATSON RESEARCH CENTER (United States)

c IBM MICROELECTRONICS (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000516811 PISSN: 10711023 EISSN: None Source Type: Journal
DOI: 10.1116/1.590309 Document Type: Article

Times cited : (10)

References (13)

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