Composition and conduction properties of silicon nitrides deposited by plasma-enhanced ultra-high-vacuum chemical vapour deposition

Philosophical Magazine B: Physics of Condensed Matter; Statistical Mechanics, Electronic, Optical and Magnetic Properties

Volumn 73, Issue 5, 1996, Pages 817-831

  Mohammad, S N ^a   Tao, M ^a   Park, D G ^a   Botchkarev, A E ^a   Li, D ^a   Morkoc H ^a  

^a University of Illinois at Urbana Champaign   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000442061     PISSN: 13642812     EISSN: None     Source Type: Journal    
DOI: 10.1080/13642819608239155     Document Type: Article

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