Synthesis and characterization of alicyclic polymers with hydrophilic groups for 193 nm single-layer resist

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6888-6893

  Jung, Min Ho ^a   Jung, Jae Chang ^a   Lee, Geunsu And ^a   Baik, Ki Ho ^a  

^a Hynix Semiconductor Inc   (South Korea)

Author keywords

2 hydroxyethyl 5 norbornene 2 carboxylate; 5 norbornene 2,3 dicarboxylic acid; Adhesion; ArF resist; Polymer

Indexed keywords

EID: 0000409931     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6888     Document Type: Article

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