Improvement of the stability under illumination of a-Si:H films elaborated by ion-beam-assisted evaporation using a hydrogen-argon plasma

Journal of Applied Physics

Volumn 83, Issue 2, 1998, Pages 1103-1106

  Rinnert, H ^a   Vergnat, M ^a   Marchal, G ^a   Bumeau, A ^b  

^a INSTITUT JEAN LAMOUR   (France)

^b UNIVERSITÉ DE LORRAINE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000382007     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366800     Document Type: Article

References (13)

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