Threshold for potential sputtering of LiF

Physical Review Letters

Volumn 83, Issue 19, 1999, Pages 3948-3951

  Hayderer, G ^a   Schmid, M ^a   Varga, P ^a   Winter, H P ^a   Aumayr, F ^a   Wirtz, L ^a   Lemell, C ^a   Burgdorfer J ^a   Hagg L ^b   Reinhold, C O ^c  

^a VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

^b MID SWEDEN UNIVERSITY   (Sweden)

^c OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000327799     PISSN: 00319007     EISSN: 10797114     Source Type: Journal    
DOI: 10.1103/PhysRevLett.83.3948     Document Type: Article

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