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Volumn 3, Issue 5, 1996, Pages 1839-1847

Induced magnetic‐field effects in inductively coupled plasmas

Author keywords

ELECTRIC DISCHARGES; ELECTRON DENSITY; ION DENSITY; PLASMA HEATING; PLASMA PRODUCTION; POTENTIALS; SKIN EFFECT; WALL EFFECTS

Indexed keywords


EID: 0000287450     PISSN: 1070664X     EISSN: 10897674     Source Type: Journal    
DOI: 10.1063/1.871979     Document Type: Article
Times cited : (44)

References (18)
  • 1
    • 0003568792 scopus 로고
    • edited by M. Francombe and J. Vossen (Academic, New York,)
    • M. A. Lieberman and R. A. Gottscho, in Physics of Thin Films, edited by M. Francombe and J. Vossen (Academic, New York, 1994), Vol. 18.
    • (1994) Physics of Thin Films , vol.18
    • Lieberman, M.A.1    Gottscho, R.A.2
  • 8
    • 0030204899 scopus 로고    scopus 로고
    • Electron kinetics in radio-frequency magnetic fields of inductive plasma sources
    • to appear in Plasma Sources Sci. Technol.
    • R. H. Cohen and T. D. Rognlien, “Electron kinetics in radio-frequency magnetic fields of inductive plasma sources,” to appear in Plasma Sources Sci. Technol. (1996).
    • (1996)
    • Cohen, R.H.1    Rognlien, T.D.2
  • 12
    • 3343015590 scopus 로고
    • PRLTAO, “Simulation of kinetic effects in inductive discharges,” to appear in Plasma Sources Sci. Technol.
    • M. M. Turner, Phys. Rev. Lett. 71, 1844 (1993), PRLTAO“Simulation of kinetic effects in inductive discharges,” to appear in Plasma Sources Sci. Technol.
    • (1993) Phys. Rev. Lett. , vol.71 , pp. 1844
    • Turner, M.M.1
  • 18
    • 85024793095 scopus 로고    scopus 로고
    • Characterization of low-frequency inductively coupled plasma sources
    • to appear in J. Vac. Sci. Technol. A.
    • M. Tuszewski and J. A. Tobin, “Characterization of low-frequency inductively coupled plasma sources,” to appear in J. Vac. Sci. Technol. A.
    • Tuszewski, M.1    Tobin, J.A.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.