Energy-dispersive, x-ray reflectivity density measurements of porous SiO2 xerogels

Applied Physics Letters

Volumn 76, Issue 2, 2000, Pages 158-160

  Windover, D ^a   Lu, T M ^a   Lee, S L ^b   Kumar, A ^c   Bakhru, H ^c   Jin, C ^d   Lee, W ^d,e  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

^b Benet Laboratories   (United States)

^c STATE UNIVERSITY OF NEW YORK   (United States)

^d TEXAS INSTRUMENTS   (United States)

^e TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000282390     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.125688     Document Type: Article

References (10)

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