Effect of compression on grain growth in Al films

Applied Physics Letters

Volumn 73, Issue 25, 1998, Pages 3677-3679

  Volkert, C A ^a,b   Lingk, C ^b  

^a MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^b LUCENT TECHNOLOGIES   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000281210     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.122860     Document Type: Article

References (11)

1. R. Venkatraman, J. C. Bravman, W. D. Nix, P. W. Davies, P. A. Flinn, and D. B. Fraser, J. Electron. Mater. 19, 1231 (1990).
2. J. D. Mun, A. P. Sutton, and B. Derby, Philos. Mag. A 76, 289 (1997).
3. Y.-C. Joo, P. Müllner, S. P. Baker, and E. Arzt, Materials Research Society Proceedings, Pittsburgh, 1997 (unpublished), p. 473.
4. P. A. Flinn and C. Chiang, J. Appl. Phys. 67, 2927 (1990).
5. W. A. Brantley, J. Appl. Phys. 44, 534 (1973).
6. L. C. Feldman, J. W. Mayer, and S. T. Picraux, Materials Analysis in Ion Channeling (Academic, New York, 1983).
7. D. B. Knorr and J. A. Szpunar, J. Morphol. 46, 42 (1994).
8. G. Gottstein, D. A. Molodov, U. Czubayako, and L. S. Shvindlerman, J. Phys. IV 5, C3-89 (1995).
9. R. Carel, C. V. Thompson, and H. J. Frost, Acta Metall. Mater. 44, 2479 (1996).
10. C. V. Thompson and R. Carel, J. Mech. Phys. Solids 44, 657 (1996).
11. W. W. Mullins, Acta. Metall. Mater. 6, 414 (1957).