Improved reflectivity control of APEX-E positive tone deep-UV photoresist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 2195, Issue , 1994, Pages 461-477

  Conley, Willard ^a   Akkapeddi, Ravindra ^a   Fahey, James ^a   Hefferon, George ^a   Holmes, Steven ^a   Spinillo, Gary ^a   Sturtevant, John ^a   Welsh, Kevin ^a  

^a IBM RESEARCH   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

LASER RECORDING; SCANNING;

AROMATIC DYES; DEPTH OF FOCUS; FOCUS LATITUDE; OPTICAL SCANNERS; PROCESS ENHANCEMENTS; PROCESS LATITUDES; SIDEWALL ANGLES; THIN-FILM INTERFERENCE;

PHOTORESISTS;

EID: 85045208136     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.175360     Document Type: Conference Paper

References (16)

1. A. R. Neureuther, IBM Tech. Disci. Bull. 6, 334 (1973).
2. M. Cagan, M. Blanco, V. Wise, P. Trefonas III, B. Daniels, C. McCants, SPIE, 1086, 515 (1989) and references therein.
3. W. Moreau, Semiconductor Lithography Principles, Practices and Materials, Chapter 8, Plenum Press, N. Y. 1989.
4. C. Mack, Solid State Technology, Jan. (1988), P. 125.
5. H. Roschert, Ch. Eckes, G. Pawlowski, SPIE, 1925, 342 (1993).
6. G. Pawlowski, T. Sauer, R. Dammel, D. Gordon, W. Hinsberg, D. McKean, C. Lindley, H. Merrem, H. Roschert, R. Vicari, C. G. Willson, SPIE, J. 26Z 391 (1990).
7. C. Osuch, M. McFarland, K. Brahim, F. Hopf, C. Wu, A. Mooring, Proceedings SPIE, 3j, 68 (1986)
8. W. Brunsvold, W. Conley, D. Crockatt, N. Iwamoto, SPIE, 1086, 357 (1989).
9. W. Brunsvold, W. Conley, W. Montgomery, W. Moreau, ACS Polymers for Micr6elec-Tronics, 537 333 (1994).
10. R. Wood, C. Lyons, J. Conway, R. Mueller, Proc. , KTI, INTERFACE 88, 1988 Pg. 341.
11. U. S. Patent 5, 256, 522
12. P. Bakeman, A. Bergendahi, M. Hakey, D. Horak, S. Luce, B. Pierson, IEEE Symposium on VSLI Technology, j. j, 11(1990).
13. F. H. Dill, A. R. Neureuther, J. A. Tuttle, E. J. Walker, Modeling Projection Printing of Positive Photoresists, IEEE Transactions on Electron Devices, ED-22, 7, 456 (1975).
14. B. Kuyel, H. Sewell, J. Vac. Sd. Technol. B8, 1385, (1990).
15. T. Ohfuju, O. Nalamasu, D. Stone, J. Vac. Sci. Technol. . U, 2714 (1993)
16. G. Thommes, V. Webers, J. Imag. Sci. , 112 (1985).