Water soluble EB resist based on amino-containing polymer

Journal of Photopolymer Science and Technology

Volumn 12, Issue 2, 1999, Pages 369-372

  Nagasaki, Yukio ^a   Sato, Yasuo ^a   Kato, Masao ^a   Aoki, Hidetoshi ^b   Tokuda, Takashi ^b  

^a TOKYO UNIVERSITY OF SCIENCE   (Japan)

^b Hokushin Corporation   (Japan)

Author keywords

Acid Generator Effect; Electron Bram Resist; Mechanism; Poly(dimethylaminopropyl acrylamide); Positive Resist; Water Soluble Resist

Indexed keywords

EID: 0000247983     PISSN: 09149244     EISSN: None     Source Type: Journal    
DOI: 10.2494/photopolymer.12.369     Document Type: Article

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