Implantation and growth of large β-FeSi2 precipitates and α-FeSi2 network structures in silicon

Applied Physics Letters

Volumn 69, Issue 21, 1996, Pages 3176-3178

  Reuther, H ^a   Dobler, M ^a  

^a INSTITUTE OF ION BEAM PHYSICS AND MATERIALS RESEARCH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000227420     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.117952     Document Type: Article

References (13)

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