Effects of gallium doping on the properties of amorphous-SiC:H films prepared by magnetron cosputtering

Journal of Applied Physics

Volumn 83, Issue 4, 1998, Pages 2067-2071

  Saito, N ^a   Inui, Y ^b   Yamaguchi, T ^b   Nakaaki, I ^c  

^a NATIONAL INSTITUTE OF TECHNOLOGY   (Japan)

^b SHIZUOKA UNIVERSITY   (Japan)

^c Shizuoka Prefectural Fuji Industrial Institute   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000225345     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.366939     Document Type: Article

References (11)

1. See, for example Amorphous Silicon and Related Materials, edited by H. Fritzsche (World Scientific, Singapore, 1989).
2. N. Saito, Y. Inui, T. Yamaguchi, and I. Nakaaki, Thin Solid Films 281-282, 302 (1996).
3. N. Saito, J. Non-Cryst. Solids 108, 211 (1989).
4. N. Saito, T. Goto, Y. Tomioka, and T. Yamaguchi, J. Appl. Phys. 69, 1518 (1991).
5. N. Saito, T. Yamaguchi, and I. Nakaaki, J. Appl. Phys. 78, 3949 (1995).
6. H. Shanks, C. J. Fang, L. Ley, M. Cardona, F. J. Demond, and S. Kalbitzer, Phys. Status Solidi B 100, 43 (1980).
7. G. Lucovsky, P. Santos-Filho, Z. Lu, Z. Jing, and J. L. Whitten, J. Non-Cryst. Solids 190, 169 (1995).
8. N. F. Mott and E. A. Davis, in Electronic Processes in Non-Crystalline Materials (Clarendon, Oxford, 1979), p. 289.
9. J. Bullot, M. Gauthier, M. Schmidt, Y. Catherine, and A. Zamouche, Philos. Mag. B 49, 489 (1984).
10. N. Saito, T. Yamada, T. Yamaguchi, I. Nakaaki, and N. Tanaka, Philos. Mag. B 52, 987 (1985).
11. W. E. Spear, R. J. Loveland, and A. Al-Sharbaty, J. Non-Cryst. Solids 15, 410 (1974).