Widely changing probability of surface damage creation induced by a single ion in the MeV ion energy range

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 16, Issue 4, 1998, Pages 1914-1918

  Ogiso, Hisato ^a   Tokumoto, Hiroshi ^a   Nakano, Shizuka ^b   Yamanaka, Kazushi ^b,c  

^a NATL INST FOR ADV INTERDISC RES   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^c TOHOKU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000215774     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.590107     Document Type: Article

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