Ring-field extreme ultraviolet exposure system using aspherical mirrors

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 37, Issue 12 B, 1998, Pages 6750-6755

  Murakami, Katsuhiko ^a   Oshino, Tetsuya ^a   Kinoshita, Hiroo ^b   Watanabe, Takeo ^b   Niibe, Masato ^b   Ito, Masaaki ^c   Oizumi, Hiroaki ^c   Yamanashi, Hiromasa ^c  

^a NIKON CORPORATION   (Japan)

^b UNIVERSITY OF HYOGO   (Japan)

^c HITACHI LTD   (Japan)

Author keywords

Aspherical mirror; EUVL; Extreme ultraviolet lithography; Multilayer mirrors; Soft X ray; Synchrotron radiation

Indexed keywords

EID: 0000177250     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.37.6750     Document Type: Article

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