Hydrogen in chemical vapour deposited diamond films

Vacuum

Volumn 47, Issue 11, 1996, Pages 1259-1264

  Sharda, T ^a   Misra, D S ^a   Avasthi, D K ^b  

^a INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

^b INTER UNIVERSITY ACCELERATOR CENTRE   (India)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HYDROGEN; IMPURITIES; PLASMA DIAGNOSTICS; PRESSURE EFFECTS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS;

ELECTRIC RECOIL DETECTION ANALYSIS; HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD); MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD);

DIAMOND FILMS;

EID: 0030284320     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(96)00166-2     Document Type: Article

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