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17SH is at the nickel-"monolayer" interface after adsorption. However, the ADXPS measurements of 11-mercaptoundecanoic acid (see ref 9) and 11-mercaptoundecanol (this work), each with an extra heteroatom (i.e., oxygen) for comparison, suggest that the oxygen in their respective thiol molecules resides closer to the outer UHV-monolayer interface, and that the sulfur is deeper within the surface.
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Thus, it is not likely that pinhole or other defects in the SAM film, exposing the nickel substrate, are likely to be the cause of the observed water
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2 (g) at high temperatures (T > 400 K). (See Russell, et al. Surf. Sci. 1987, 183, 316.) Thus, it is not likely that pinhole or other defects in the SAM film, exposing the nickel substrate, are likely to be the cause of the observed water.
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