Spray CVD of copper indium disulfide films: Control of microstructure and crystallographic orientation

Chemical Vapor Deposition

Volumn 5, Issue 3, 1999, Pages 105-108

  Hollingsworth, Jennifer A ^a   Hepp, Aloysius F ^b   Buhro, William E ^a  

^a WASHINGTON UNIVERSITY   (United States)

^b NASA GLENN RESEARCH CENTER   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000001240     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/(sici)1521-3862(199906)5:3<105::aid-cvde105>3.0.co;2-g     Document Type: Article

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