Photocatalytic properties of titanium oxide films prepared by gas flow sputtering method

Electrochemistry

Volumn 72, Issue 10, 2004, Pages 676-679

  Anzai, Naoto ^a   Yoshihara, Sachio ^a   Shirakashi, Takashi ^a   Kurokawa, Kazunari ^a   Ishii, Kiyoshi ^a  

^a UTSUNOMIYA UNIVERSITY   (Japan)

Author keywords

Gas Flow Sputtering; Photocatalytic Activity; Titanium Oxide

Indexed keywords

CRYSTAL ORIENTATION; FLOW OF FLUIDS; OXYGEN; PHOTOCATALYSIS; SPUTTERING; SUBSTRATES; SYNTHESIS (CHEMICAL);

GAS FLOW; GAS FLOW SPUTTERING; PHOTOCATALYTIC ACTIVITY; TITANIUM PARTICLES;

TITANIUM OXIDES;

EID: 9944253304     PISSN: 13443542     EISSN: None     Source Type: Journal    
DOI: 10.5796/electrochemistry.72.676     Document Type: Article

References (5)

1. I. M. Cabrera, M. O. Alfano, and E. A. Cassano, J. Phys. Chem., 100, 20043 (1996).