On the time of lasing onset and the end-effect of a soft x-ray laser device using a capillary z-pinch discharge

Plasma Sources Science and Technology

Volumn 13, Issue 4, 2004, Pages 675-679

  Hayashi, Yasushi ^a   Sakamoto, Nobuhiro ^a   Zhao, Yongpeng ^a   Cheng, Yuanli ^a   Chalise, Priya ^a   Watanabe, Masato ^a   Okino, Akitoshi ^a   Horioka, Kazuhiko ^a   Hotta, Eiki ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC DISCHARGES; ELECTRIC POWER SYSTEMS; LITHOGRAPHY; PLASMA DIODES; PULSE WIDTH MODULATION; SPECTROSCOPIC ANALYSIS;

NANO-FABRICATION; PULSE FORMING LINE (PFL); SOFT X-RAY (SXR) LASERS; X-RAY DIODE (XRD);

X RAY LASERS;

EID: 9944246059     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/13/4/017     Document Type: Article

References (6)

1. Attwood D 1999 Soft X-Rays and Extreme Ultraviolet Radiation (Cambridge: Cambridge University Press)
2. Rocca J J, Shlyaptsev V, Tomasel F G, Cortazar O D, Hartshorn D and Chilla J L A 1994 Phys. Rev. Lett. 73 2192
3. Macchietto C D, Benware B R and Rocca J J 1999 Opt. Lett. 24 1115-17
4. Niimi G, Hayashi Y, Okino A, Watanabe M and Hotta E 2001 J. Plasma Fusion Res. 77 1239 (in Japanese)
5. Niimi G, Hayashi Y, Sakamoto N, Nakajima M, Okino A, Watanabe M, Horioka K and Hotta E 2002 IEEE Trans. Plasma Sci. 30 616
6. Hayashi Y, Xiao Y, Sakamoto N, Miyahara H, Niimi G, Watanabe M, Okino A, Horioka K and Hotta E 2003 Japan. J. Appl. Phys. 42 5285