On the effect of crystallographic orientation on ductile material removal in silicon

Precision Engineering

Volumn 29, Issue 1, 2005, Pages 124-132

  O'Connor, Brian P ^a   Marsh, Eric R ^b   Couey, Jeremiah A ^b  

^a AeroTech Inc   (United States)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

Critical chip thickness; Crystallographic orientation; Diamond turning; Silicon

Indexed keywords

CRYSTALLOGRAPHY; CUTTING; DIAMONDS; DUCTILITY; LATTICE CONSTANTS; MACHINING;

CRITICAL CHIP THICKNESS; CRYSTALLOGRAPHIC ORIENTATION; DIAMOND TOOLS; DIAMOND TURNING;

SILICON;

EID: 9944245425     PISSN: 01416359     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.precisioneng.2004.05.004     Document Type: Article

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