Resistant behavior of a novel silica-based octyl(phenyl)-N,N-diisobutyl carbamoylmethylphoshine oxide neutral extraction resin against nitric acid, temperature and γ-radiation

Radiation Physics and Chemistry

Volumn 72, Issue 4, 2005, Pages 455-463

  Zhang, Anyun ^a   Wei, Yuezhou ^a   Kumagai, Mikio ^a   Koma, Yoshikazu ^b   Koyama, Tomozo ^b  

^a INSTITUTE OF RESEARCH AND INNOVATION   (Japan)

^b JAPAN ATOMIC ENERGY AGENCY   (Japan)

Author keywords

Radiation; MAREC process; Octyl(phenyl) N,N diisobutylcarbamoylmethylphoshine oxide; Resistant behavior; Silica based extraction resin

Indexed keywords

ADSORPTION; DOSIMETRY; EXTRACTION; GAMMA RAYS; LINEAR EQUATIONS; NITRIC ACID; SILICA;

ADSORPTION PROPERTIES; EXTRACTION RESINS; RESISTANT BEHAVIOR;

RESINS;

CARBON; NEODYMIUM; NITRIC ACID; OCTYL(PHENYL) N,N DIISOBUTYLCARBAMOYLMETHYLPHOSPHINE OXIDE; PHOSPHINE OXIDE DERIVATIVE; PHOSPHORUS; RESIN; SILICON DIOXIDE; UNCLASSIFIED DRUG;

ADSORPTION; ARTICLE; CONCENTRATION (PARAMETERS); EVALUATION; EXTRACTION; GAMMA RADIATION; QUANTITATIVE ANALYSIS; RADIATION; RADIATION DOSE; TEMPERATURE; THERMOSTABILITY;

EID: 9944231136     PISSN: 0969806X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radphyschem.2004.01.004     Document Type: Article

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