Nanostructure formation on ion-eroded SiGe film surfaces

Superlattices and Microstructures

Volumn 36, Issue 1-3, 2004, Pages 281-291

  Hofer, C ^a   Teichert, C ^a   Wachter M ^b   Bobek, T ^b   Lyutovich, K ^c   Kasper, E ^c  

^a UNIVERSITY OF LEOBEN   (Austria)

^b RWTH AACHEN UNIVERSITY   (Germany)

^c UNIVERSITY OF STUTTGART   (Germany)

Author keywords

Atomic force microscopy; Ion bombardment; Nanopattern formatiop; SiGe nanostructures

Indexed keywords

ATOMIC FORCE MICROSCOPY; CRYSTALLINE MATERIALS; GERMANIUM ALLOYS; HETEROJUNCTIONS; ION BOMBARDMENT; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON COMPOUNDS; SPUTTERING;

ION EROSION; NANOPATTERN FORMATION; SELF-ORGANIZATION; SIGE NANOSTRUCTURES;

NANOSTRUCTURED MATERIALS;

EID: 9644288241     PISSN: 07496036     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.spmi.2004.08.003     Document Type: Article

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